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Characterisation
Argon Cluster Ion Source
Description
The multi-mode gas ion cluster source (GCIS) is designed to operate in both Arn+ cluster and Ar+ single atom modes making it suitable for cleaning and depth profiling of organic, inorganic or metallic thin films. In addition, it can also be used to generate low energy He+ ions for use in ion scattering spectroscopy (ISS).
- Ideal for depth profiling of organic materials
- Conservation of chemical state and interfaces
- Cluster energy range: 0.2-20 keV
- Cluster size adjustable from Ar250+ to Ar2000+.
- Full control by ESCApe software: gas pressure, valves, parameters...
- Can be used with Axis Supra+ and Nova2
- Flange mounted DN64 (Ext. Diam. 4.5'')
- Differential pumping by 2 turbomolecular pumps
- High performance for surface cleaning and image enhancement
- Our standards
- Description
- Downloads
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Description
The multi-mode gas ion cluster source (GCIS) is designed to operate in both Arn+ cluster and Ar+ single atom modes making it suitable for cleaning and depth profiling of organic, inorganic or metallic thin films. In addition, it can also be used to generate low energy He+ ions for use in ion scattering spectroscopy (ISS).
- Ideal for depth profiling of organic materials
- Conservation of chemical state and interfaces
- Cluster energy range: 0.2-20 keV
- Cluster size adjustable from Ar250+ to Ar2000+.
- Full control by ESCApe software: gas pressure, valves, parameters...
- Can be used with Axis Supra+ and Nova2
- Flange mounted DN64 (Ext. Diam. 4.5'')
- Differential pumping by 2 turbomolecular pumps
- High performance for surface cleaning and image enhancement
Downloads
Datasheets
Gas Cluster Ion Source brochure.pdfIf you want an offer, or more information on this product, contact us:
Fast delivery
in France and Europe
ISO 9001
and 14001 certifications
Service / Maintenance of
mechanical components