Materials

Targets

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Sputtering targets

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Information guide

Neyco provides several types of targets for sputtering:

  • Pure or alloyed metal targets (binary/ternary/quaternary/+), from 99% to 99.999%.
  • Hot pressed oxides and intermetallic targets without binder: Al2O3, AZO, ITO, PZT, SiO2, ZnO...
  • Industrial application targets: Al, Ni/Cr, Mo, Ta, Ti/Al, W …

Most sputtering targets can be fabricated into a wide range of shapes and sizes such as : circular, rectangular, Delta, ring, tube and more on request. 

There are some technical limitations to the maximum size for a given single piece construction. In such cases, a multi-segmented target can be produced with the individual segments joined together by butt or beveled joints.

All targets are delivered with a certificate of analysis.

The materials are checked before shipping with a X-fluorescence analyzer. Certificate on request. 

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Silicon based targets, Si
Materials

Silicon based targets, Si