Sputtering targets
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Neyco provides several types of targets for sputtering:
- Pure or alloyed metal targets (binary/ternary/quaternary/+), from 99% to 99.999%.
- Hot pressed oxides and intermetallic targets without binder: Al2O3, AZO, ITO, PZT, SiO2, ZnO...
- Industrial application targets: Al, Ni/Cr, Mo, Ta, Ti/Al, W …
Most sputtering targets can be fabricated into a wide range of shapes and sizes such as : circular, rectangular, Delta, ring, tube and more on request.
There are some technical limitations to the maximum size for a given single piece construction. In such cases, a multi-segmented target can be produced with the individual segments joined together by butt or beveled joints.
All targets are delivered with a certificate of analysis.
The materials are checked before shipping with a X-fluorescence analyzer. Certificate on request.